| abstract |
The present invention relates to a salt, a process for producing a salt and a deactivating agent as well as a resist composition comprising the same, said salt being represented by the formula (I) as defined in claim 1 wherein, in formula (I), R1 and R2 each represent a hydrocarbon group, and -CH2- included in the hydrocarbon group may be replaced by -O- or -CO-; R3, R4 and R5 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, and CH2- included in the hydrocarbon group may be replaced by -O- or -CO-; m3 represents an integer of 0 to 2, and when m3 is 2, two R3s may be the same or different from each other; and m4 and m5 represent an integer of 0 to 5, and when m4 and / or m5 is / are 2 or more, a plurality of R4 and / or a plurality of R5 may be the same or different from each other. |