| abstract |
The present invention can provide a salt and a resist composition capable of producing a resist pattern with satisfactory line edge inequality (IBT). A salt represented by formula (I) as shown in claim 1; (C6H2R1R2 (R6) m6) (C6H2R3R4 (R7) m7) (C6H3 (R5) m5 (R8) m8) S + Al- wherein in formula (I), R1, R2, R3, R4 and R5 each independently represent an atom of halogen or a perfluoroalkyl group having 1 to 6 carbon atoms, R6, R7 and R8 each independently represent a halogen atom, a hydroxy group, a fluorinated alkyl group having 1 to 6 carbon atoms or an alkyl group having 1 to 6 carbon atoms, at 12 carbon atoms, and -CH2- included in the alkyl group may be replaced by -O- or -CO-, m5 represents an integer of 1 to 5, and when m5 is 2 or more, a plurality of R5 may be identical or different, m6 represents an integer of 0 to 3, and when m6 is 2 or more, a plurality of R6 may be the same or different, m7 is an integer of 0 to 3, and when m7 is 2 or more, a plurality R7 may be the same or different, m8 is an integer of 0 to 4, and when m8 is 2 or more, a plurality of R8 may be the same or different, in which 1 ≤ m5 + m8 ≤ 5, and AI- represents an organic anion. |