| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_00b6a7d89068f217d1f4efa9a94c5ded |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N1-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T436-12 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-4168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N1-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01D21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N17-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-4167 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-416
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-18 |
| filingDate |
2021-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fab989890f1c0b5288ddfbaedd4f3c6b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0b8446f004ec71b26999cb6a7976f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_668af081ac871edece4243039764830a |
| publicationDate |
2022-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
AU-2021200841-B2 |
| titleOfInvention |
Apparatus for, system for and method of maintaining sensor accuracy |
| abstract |
Methods of maintaining accuracy in the measurement of one or more parameters of nindustrial water in industrial water systems is disclosed. The methods comprise the use of nphysical and chemical means to prevent and/or remove deposition from one or more surfaces nutilized in measurement of the one or more parameters. The deposition may be caused by, for nexample, corrosion, fouling, or microbiological growth. |
| priorityDate |
2015-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |