http://rdf.ncbi.nlm.nih.gov/pubchem/patent/AU-2011201782-A1

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-203
filingDate 2011-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_637df9c9de63fea105175161cbec4196
publicationDate 2011-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber AU-2011201782-A1
titleOfInvention Vapor deposition apparatus and process for continuous indirect deposition of a thin film layer on a substrate
abstract VAPOR DEPOSITION APPARATUS AND PROCESS FOR CONTINUOUS INDIRECT DEPOSITION OF A THIN FILM LAYER ON A SUBSTRATE A13STRACT OF THE DISCLOSURE An apparatus and related process are provided for vapor deposition of a sublimated source material as a thin film on a photovoltaic (PV) module substrate. A deposition head is configured for sublimating a source material supplied thereto. The sublimated source material condenses onto a transport conveyor disposed below the deposition head. A substrate conveyor is disposed below the transport conveyor and conveys substrates in a conveyance path through the apparatus such that an upper surface of the substrates is opposite from and spaced below a lower leg of the transport conveyor. A heat source is configured adjacent the lower leg of the transport conveyor. The Source material plated onto the transport conveyor is sublimated along the lower leg and condenses onto to the upper surface of substrates conveyed by the substrate conveyor.
priorityDate 2010-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.